Krypton-sputtered tantalum fil... Note

Krypton-sputtered tantalum films for scalable high-performance quantum devices

Krypton sputtering is found to promote the synthesis of body-centred-cubic tantalum films on silicon at temperatures as low as 200 °C, compatible with back-end-of-line fabrication standards. Superconducting qubits based on these thin films exhibit excellent performance.